Mask Data Management
Using SEMI P10
Like the underpinnings of Moore's
law always driving the ever-greater complexities of
design and device manufacturing methods, they drive as
well, the ever-greater complexities of moving a design
from CAD tools and layout databases (and) into the
mask manufacturing process. Many, many more factors
(than in previous years) influence the quality and the
cost of the outcome of this process which is
to be a set of defect-free photomasks.
Today, there is no commercial
implementation of SEMI P10. The lack of a commercial
P10 implementation invites non-compliance, matters
related to (a lack of) completeness and of matters
which drive people to make errors simply because the
mask order has become too unwieldy to handle through
unique, mostly incomplete, implementations of P10.
Because of these types of issues, Oasis Tooling
thought it important to develop a commercial
implementation of SEMI P10.
The technology is modular by
construction. Each module integrates through a
configurable data interchange mechanism so that
updates and changes to orders can be easily, and with
less error, be maintained with substantially less
human involvement.
For additional
information about this technology, please email us at
inquiries@oasistooling.com.
